Metallic Impurity Analysis in Semiconductor FAB Utilizing ICP-MS


In this webcast, Katsu Kawabata, President, IAS Inc. discusses the sources and requirements of metallic contamination control in semiconductor FAB and the preferred fully automated systems utilizing ICP-MS. The analyses and topics discussed include:

  • Wafer analysis using vapor phase decomposition (VPD)-ICP-MS
  • Direct analysis of various chemicals using online-ICP-MS
  • Direct analysis of various gases using gas exchange device (GED)-ICP-MS
  • Risk mitigation of utilizing fully automated system
  • IAS Software integrates with PerkinElmer's Syngistix™ software for fully automated online analysis in semiconductor FABs

Like what you're reading?

To view the full content, please answer a few questions.