Analysis of High-Purity Silicon Matrices for Trace Contaminants

Introduction

This 10-minute mini-webinar presented by Ewa Pruszkowski PhD will show you an analytical method in trace contaminant detection in Si matrices using a multi-quadrupole ICP-MS. Improving evolution of ICP-MS technology over the last 40 years has culminated in the PerkinElmer NexION 5000 to satisfy the extremely high instrument sensitivity cps, ppt and sub ppt levels of detection needed by the semiconductor industry producing silicon and polysilicon wafers.

The following will be discussed:

• Interference Removal
• Optimization of Analysis Parameters
• Assessment of Reaction Rates
• Calibrate Curves in Si Matrix using MSA
• Analysis Results