Introduction
Semiconductor manufacturers require ultra-pure N-methyl-2-pyrrolidone (NMP) to support advanced fabrication processes, making accurate trace elemental analysis critical to product quality and yield. However, the complex organic matrix and the need to quantify contaminants at ppt to sub-ppt levels can make interference removal challenging, often requiring multiple reaction gases and more complex analytical workflows.
This application note demonstrates how the NexION® 5000 multi-quadrupole ICP-MS simplifies semiconductor-grade NMP analysis without compromising performance. By using oxygen as the reaction gas to effectively eliminate spectral interferences for elements traditionally measured with ammonia, laboratories can streamline method development while achieving outstanding analytical results. The study demonstrates excellent linearity, exceptionally low background equivalent concentrations (BECs) and method detection limits (MDLs), and accurate spike recoveries, enabling reliable quantification of trace elements at the ultra-low levels demanded by semiconductor manufacturing. The result is a simplified, high-performance workflow that delivers the sensitivity, confidence, and productivity needed for today's most demanding semiconductor applications.
Ready to simplify your semiconductor-grade NMP analysis? Download this application note to see how the NexION 5000 ICP-MS delivers exceptional sensitivity with a streamlined workflow.
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