The NexION® 5000 multi-quadrupole ICP-MS system – the first in its category to boast four quads – is innovatively designed to meet and exceed the demanding trace-elemental testing requirements of semiconductor, biomonitoring and other applications. It takes ICP-MS performance beyond high-resolution ICP-MS and traditional triple-quad technology to deliver exceptionally low background equivalent concentrations (<1 ppt, even in hot plasma) and outstanding detection limits, key to ensuring accurate and repeatable results. The NexION 5000 ICP-MS provides superior interference removal, outstanding background equivalent concentrations (BECs), phenomenal stability, and unmatched matrix tolerance.
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The NexION 5000 ICP-MS is equipped with a host of new and proprietary technologies which together surpass traditional triple-quad capabilities and redefine your expectations:
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Concern about air pollution has been growing rapidly, with most of the focus on gaseous pollutants. Airborne particulates, especially small ones, are rapidly gaining attention due to their impact on human health, as smaller particles can be carried over long distances by wind and penetrate deep into the lungs, where contaminants can have direct interaction with lung tissue and the associated blood vessels. Airborne particulates are classified as PM10 for those with aerodynamic diameters less than 10 µm and PM2.5 for those with aerodynamic diameters less than 2.5 µm.
PM2.5 regulations have been implemented throughout the world, and in order to implement a regime to reduce the concentration of PM2.5, it is important to determine the origins of these particulates, hence the need to collect and analyze them.
ICP-MS is often the analytical instrument of choice for such applications due to its low detection limits and wide linear dynamic range. This work describes the collection, sample preparation and inorganic elemental analysis of atmospheric PM10 and PM2.5 using PerkinElmer’s NexION® ICP-MS.
Since ultrapure water (UPW) is used throughout the semiconductor industry in a variety of applications, impurities need to be controlled as these will directly impact the quality and overall yield of semiconductor products. ICP-MS is often used to accurately quantify sub-ppt concentrations of impurities due to its ability to provide accurate quantification of elements at low concentrations.
This work demonstrates the fast, ultratrace analysis of elements whose detection limits are often compromised by argon-based interferences in UPW using the NexION 5000 Multi-Quadrupole ICP-MS. The use of hydrogen and a single plasma mode (Cold Plasma) allowed for analysis times as short as 116 seconds per sample to be achieved, supporting the rapid response needs for UPW analysis in semiconductor laboratories.
Nitric acid is widely used throughout the semiconductor and electronics industry. Various purity grades are required depending on the application and the intended use. For this reason, the semiconductor industry has required ever-lower detection of a broad range of impurities, including non-metallic elements, in nitric acid solutions in order to meet manufacturing requirements.
Due to the presence of complex spectral interferences resulting from plasma gases and the sample matrix, low-ppt quantification of non-metallic elements in dilute nitric acid can be challenging using conventional ICP-MS. This issue is easily addressed with an ICP-MS system that not only mass filters the ions before they enter the collision-reaction cell but also controls the reaction in the cell, a feature only available in quadrupole cells. This works describes a mixed-mode method to determine detection limits and background equivalent concentrations of non-metallic impurities in a dilute nitric acid solution leveraging the unique capabilities of the NexION® 5000 Multi-Quadrupole ICP-MS.
For many years, inductively coupled plasma mass spectrometry (ICP-MS) has been the tool of choice for the trace analysis of elements like lead (Pb), arsenic (As), mercury (Hg), and copper (Cu) in bodily fluids such as urine, blood, serum and saliva, as well as in tissues.
Blood and serum are two common biological fluids which present challenges for trace metal analysis. Blood is a complex mixture, composed mostly of water, but also contains proteins, glucose, mineral salts, hormones, as well as red and white blood cells. Serum is derived from blood and has a similar composition, although it does not contain red or white blood cells or fibrinogens.
This work demonstrates the ability of PerkinElmer’s NexION® 5000 multi-quadrupole ICP-MS to perform reproducible analyses of blood samples with outstanding stability over long sample run times, thanks to its winning combination of reaction and collision capabilities with triple quadrupole technology for spectral interference removal – this design allows for the accurate determination of low and high levels of analytes in a single analytical run.
Contaminants in chemicals used during manufacturing processes have a direct impact on product yield and reliability of semiconductor devices. Within the whole process of integrated circuit manufacturing, wafers are sent for repeated cleaning using hydrogen peroxide (H2O2). Semiconductor Equipment and Materials International (SEMI) standard for H2O2, SEMI C30-1110 - Specifications for Hydrogen Peroxide SEMI Grade 51, specifies maximum contamination levels of 10 ppt for most trace elements.
In this application note, we describe the analysis of 46 elements in 35% H2O2 using the NexION® 5000 Multi-Quadrupole ICP-MS, which offers the ability within a single analysis to determine non-metallic elements down to ppt levels together with other trace metals down to sub-ppt levels. This capability is critical in the analysis of trace contaminants in H2O2, which is used in multiple stages of the wafer fabrication process.
For decades, the semiconductor industry has been designing new devices that are smaller, faster and consume less power than their predecessors. To maintain this trend, the critical features of these devices must also become smaller and have fewer defects. The small diameter of a chip’s features requires the use of higher purity materials. As a result, all liquid chemicals and solid materials used in semiconductor processes should contain extremely low levels of contaminants.
Ultrapure water (UPW) is one of the most essential chemicals in the production of semiconductor devices and is used extensively for all wet-processing steps, including wafer rinsing and the dilution of compounds used in chemical baths.
This application note describes a method for the characterization of UPW using PerkinElmer's NexION® 5000 multi-quadrupole ICP-MS, demonstrating outstanding analytical performance in terms of detection limits (DLs) and background equivalent concentrations (BECs) thanks to its four quadrupoles and a wide range of other technological advantages.
The production of electronic devices is a complex process that requires the use of ultra-pure chemicals during the manufacturing steps. High-purity-grade sulfuric acid (H2SO4) is generally used for cleaning components and etching all metal and organic impurities on silicon wafers.
Impurities in sulfuric acid, or any other chemicals used in semiconductor fabrication, can critically impact device quality and yield. This work describes the analysis of 52 elements in high-purity sulfuric acid using the NexION® 5000 Multi-Quadrupole ICP-MS, which delivers the outstanding analytical performance required by the semiconductor industry for difficult matrices such as 10% H2SO4.
As the limits of detection (LODs) for trace metal analysis are increasingly being pushed to the next decimal, a need exists to meet these new detection requirements without compromising accuracy or precision. Inductively coupled plasma mass spectrometry (ICP-MS) is often the technique of choice for routine applications requiring ultra-trace detection limits.
For a number of elements, spectroscopic interferences can have a significant impact on the ability to achieve low detection limits by traditional ICP-MS systems. In this study, we take a look at multi-quadrupole ICP-MS technology, with a focus on the mechanisms of removing spectral and other interferences to secure the LODs, accuracy, and precision needed for challenging applications.
Read this article to learn more about multi-quadrupole ICP-MS technology and its benefits.
It’s clear, glass has a variety of uses, from practical to technological to decorative. In particular, float glass is widely used in architecture, automotive, transportation, photovoltaic, and solar industries.
For glass testing labs around the world, we offer highly accurate and tailored solutions including instrumentation, accessories, software, and services, to ensure you get the most out of your analysis. Focused and flexible, our technology enables glass manufacturers to determine efficient energy storage and test raw materials for the required properties. We provide industry-trusted solutions that align with the latest glass regulations (EN, ISO, and CIE), improving the flow and productivity of your lab. Download our Interactive Brochure to learn more.
In the fast-paced analytical world, accurate and reproducible results are essential to guaranteeing quality and ensuring safety. What many industries have in common is the need for trace-element analysis with superior interference removal, extremely low detection limits, and outstanding background equivalent concentrations (BECs).
That’s the thinking behind the NexION® 5000, the industry's first multi-quadrupole ICP-MS instrument. This cutting-edge system delivers performance beyond high-resolution ICP-MS and traditional triple quad technology.
Discover the unique benefits of the NexION 5000 ICP-MS. Download the interactive brochure.
Quality control-monitoring and testing are important in ensuring the quality of palm oil. The quality control parameters are used to judge the quality of palm oil products and it can be monitored and tested to ensure that the palm oil is not deliberately or accidentally adulterated.
Look to PerkinElmer for all of your consumables and supplies for your NexION 1000, 2000, or 5000 ICP-MS system.
This document provides information to assist in preparing your laboratory for the PerkinElmer NexION® 5000 ICP-MS system prior to instrument delivery and installation.
The novel design of the second-generation Triple Cone Interface with patent-pending OmniRing™ was developed specifically for the NexION® 5000 multi-quadrupole ICP-MS with both sensitivity and stability in mind. It builds on the Triple Cone Interface geometry of the NexION series and provides unique solutions to space-charge effects based on the simple, yet highly effective OmniRing technology. Its design focuses on many attributes of an ideal interface for ICP-MS, most notably improved transmission by reducing the ion current while at the same time providing a controlled acceleration of the ions through the interface without transmitting high energy ions into the downstream ion optics. The result is much improved analyte signal intensities without the cost of elevated background levels, delivering the ability to analyze complex matrices at sub-ppt BECs and with robust plasma conditions. In addition to high sensitivity, it also significantly contributes to the unmatched stability of the NexION 5000 ICP-MS with challenging matrices. This is thanks to three stages of differential pumping and a design that minimizes surfaces prone to sample deposition and ion sputtering, such as those using extraction cones and lenses.
With the onset of the COVID-19 pandemic, the use of face masks by the general public has become a critical personal protective measure to minimize person-to-person transmission. While health care workers use medical or surgical masks, the general population uses non-medical, otherwise known as hygienic, face masks to greatly reduce the transmission of SARS-CoV-2 by capturing droplets and aerosols from those infected with the virus.
In response to the increased demand for both the number and variety of non-medical face masks, many companies are now producing them to meet the public’s need, and with this great variety, the quality and the safety of the face masks must be assessed. This work describes the considerations surrounding metal analysis in hygienic face masks used to prevent the spread of COVID-19.