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MappIR Accessory for 8” Wafers


Semiconductor wafer design and manufacturing requires maintenance of efficient and high-quality production processes that ultimately meet customer specifications and demands. Fabrication and QA/QC managers are often challenged with unreliable testing that results in production interruptions, lack of confidence in testing, or complex equipment requiring extensive training.

MappIR accessory with Spectrum 3 FT-IR system helps ensure quality, reduce fail rates, drive out impurities and deliver production results. Whether improving the final product uniformity and reducing glass-forming temperatures in front-end fabrication or evaluating and verifying doping levels to maintain and optimize production processes, MappIR delivers high-quality results you can trust in an easy-to-use interface that requires minimal training.

Part Number
8.0 in
12.0 in
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The PerkinElmer Spectrum™ 3 FT-IR spectrometer provides the sampling flexibility and performance in mid, near, and far infrared ranges through a single instrument to advance research and new product development. The highly configurable platform provides dependable, consistent, and trouble-free operation through years of service.

The MappIR accessory together with the Spectrum 3 FT-IR helps advance and accelerate your semiconductor design in the following areas:

Front-End Fabrication

  • Material identification
  • Curing verification
  • Testing to assess defects in chips
  • Contaminant or particle detection

Back-End Assembly

  • Final silicon wafer QA/QC testing
  • Defect analysis


Product Brand Name MappIR
Technology Type FT-IR
Width 8.0 in
Resources, Events & More
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Application Note

Semi-Automated FT-IR Measurements of Elemental Impurities in Silicon Wafers

Silicon wafer production is expected to grow in the coming years with increased demand for semiconductors especially in consumer electronics, automotives, and the use of silicon devices in the growing solar power industry. The Czochralski (CZ) process most widely adopted process in the industry for silicon wafer manufacturing. This process produces wafers with elemental impurities, particularly carbon and oxygen. Oxygen can have a positive benefit as it acts as a getter, removing trace metal impurities. The levels of the carbon and oxygen impurities in silicon wafers need to be determined to ensure they are not too high since this can lead to electrically active defects and product failure/rejection.

This application note describes how FT-IR spectroscopy offers a rapid and easy measurement technique to determine the levels of these impurities according to global standard methods.



Spectrum 3 FT-IR Interactive Brochure

The PerkinElmer Spectrum 3 FT-IR spectrometer provides the sampling flexibility and analytical performance in mid, near, and far infrared ranges through a single instrument to advance research and new product development in academia, chemicals, polymers, and pharmaceuticals. Read the interactive brochure to learn more about the patented technology, applications, and service that PerkinElmer offers to make Spectrum 3 a complete solution to advance your science.