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Application Note

Determination of Various Elements at Ultra-trace Levels in Ultrapure Acids and Photoresist Stripper Solutions by Graphite Furnace Atomic Absorption

Introduction

To protect the integrity of semiconductor and electronics end-products, semiconductor researchers and developers (R&D) and manufacturing QA/QC functions face unique challenges to reduce contaminates, sometimes down to ultra-trace levels. Metal determination in the sub-ppb range are required for the analysis of complex sample matrices and corrosive acids.

To meet these requirements, high-performance analytical techniques such as inductively coupled plasma mass spectrometry (ICP-MS) are preferred for rapid multi-element analysis, however, diagnosing problems can also involve only a few elements, in which graphite furnace atomic absorption spectrometry (GFAAS) is recommended.

Learn how GFAAS can help diagnose problems in semiconductor R&D and QA/QC processes.