Inline Intelligent Electronic Chemicals Quality Monitoring Series

Introduction

In this on-demand presentation video, Jess Liu of NewFast Technology talks about trace contaminant detection in chip (silicon wafer) manufacturing. The NewFast NFA-i108 series combined with the PerkinElmer NexION-5000 ICP-MS solution - means laboratories benefit from a fully enclosed chemical flow-path, fully automatic process, and intelligent product quality identification.

According to International Roadmap for Devices and Systems (IRDS), the recommended concentration limits for trace-metal is ppt level in ultra pure water (UPW) and liquid chemicals. However, to correctly indicate and monitor the trace-contaminants usually means lots of training work by each lab personnel, not to mention the considerable contamination and errors that come with traditional offline analysis system. As a solution to this, NewFast Technology provides inline 24-7 intelligent monitoring systems for growing demands on trace-contaminants detection. With NFA-i108 series alongside the NexION-5000 ICP-MS, exactly 1ppt identification in H2O2 and HF are demonstrated in this talk. Featuring enclosed chemical flow-path, fully automatic process, and intelligent product quality identification.