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The NexION® 5000 multi-quadrupole ICP-MS – the first in its category to boast four quads – is innovatively designed to meet and exceed the demanding requirements of ultra-trace elemental applications. It takes ICP-MS performance beyond traditional triple quad to deliver exceptionally low background equivalent concentrations (<1 ppt, even in hot plasma) and outstanding detection limits, key to ensuring accurate, repeatable results. Plus, the NexION 5000 provides superior interference removal, phenomenal stability and unmatched matrix tolerance.
In addition to boasting four quads, the NexION 5000 is also the proud recipient of three awards: Wiley Analytical Science Award, The Analytical Scientist Innovation Award, and R&D 100 Award.
This MicroMist™ Direct Connection Nebulizer is for use with Avio® 200/500 and Optima® 4x00/5x00/7x00/8x00 ICP-OES series instruments. It has a UniFit sample connector which slides easily over the sample arm and an argon connector configured to connect directly to your ICP. This MicroMist™ nebulizer also features an inert metal-free argon connector, instrument-specific Direct Connect flexible Argon line, and a reliable ratchet fitting that ensures leak-free gas connection. Includes Gas Fitting with ratchet connector (N0811308).
This Ratchet Nebulizer Connector is for use with Avio® and Optima® ICP-OES series instruments.
This Quartz Spray Chamber is for use with Avio® 200 ICP-OES series instruments. It features an O-ring free design as well as a 8 mm PFA adapter for one-piece torches. Includes threaded drain line.
This PC3X Thermally Stabilized Inlet System is for use with NexION® 1000/2000 ICP-MS series instruments. It includes PFA-ST3 Nebulizer (N8152378) and High Performance PFA Spray Chamber with End Cap (N8150454). The PC3x for the High Performance PFA spray chamber is a compact, Peltier heated or cooled inlet system that offers the advantages of low memory effects, constant temperature, rapid wash-out and high sample transport efficiency. In cooling mode the PC3x cools the outer walls of the chamber, reducing the water or solvent vapor loading on the plasma, achieving enhanced stability and performance. In heating mode, sensitivity can be improved for low flow applications.
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